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Lithography & Fab Tools — Basket

Leading-edge semiconductor equipment and process materials suppliers — EUV and DUV lithography systems (ASML, Nikon), etch/deposition (Lam, Applied Materials, Tokyo Electron), ALD and epitaxy (ASM International), process control and yield management (KLA), photomasks (Photronics), ion implant (Axcelis), gas/RF delivery (MKS), parts cleaning (Ultra Clean), and photoresists plus silicon wafers (Shin-Etsu Chemical) — alongside TSMC as the primary foundry beneficiary of the AI-driven front-end capex supercycle.

Constituents (16)

  • ASML HOLDING NV (ASML)
  • TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD (TSM)
  • LAM RESEARCH CORP (LRCX)
  • KLA CORP (KLAC)
  • APPLIED MATERIALS INC /DE (AMAT)
  • MKS INC (MKSI)
  • Ultra Clean Holdings, Inc. (UCTT)
  • AXCELIS TECHNOLOGIES INC (ACLS)
  • PHOTRONICS INC (PLAB)
  • Tokyo Electron Limited (8035.T)
  • ASM International N.V. (ASMI)
  • Shin-Etsu Chemical Co., Ltd. (4063.T)
  • Nikon Corporation (7731.T)
  • SCREEN Holdings Co., Ltd. (7735.T)
  • ADVANCED ENERGY INDUSTRIES INC (AEIS)
  • SUSS MicroTec AG (SMHN.DE)

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